摘要
非平衡磁控溅射(U BM S)技术近年来得到了广泛地应用。采用该技术制备的类金刚石薄膜(DLC)具有许多独特的性质。本文利用正交实验方法,对非平衡磁控溅射技术制备无氢DLC膜增透膜进行了研究,得到了影响薄膜光学性能的主要因素和最佳的制备工艺。结果表明,非平衡磁控溅射制备的无氢DLC膜具有较宽的光谱透明区,锗基底单面沉积DLC膜,其峰值透射率达到61.4%,接近理论值。
Unbalanced magnetron sputtering （UBMS） process is recently widely used in many fields. DLC films prepared by UBMS have many unique characteristics. The non-hydrogen DLC antireflective films deposited by UBMS are studied on the basis of orthogonal experiments to obtain the main influencing factors on the film＇s optical properties and the best technological parameters. The results show that DLC films prepared by UBMS have wider transparent region, of which the max. transmittance of DLC films deposited on Ge substrates could be up to 61.4% that is approaching to the theoretical value.
出处
《真空》
CAS
北大核心
2005年第5期22-25,共4页
Vacuum
关键词
非平衡磁控溅射
DLC膜
增透
正交实验
unbalanced magnetron sputtering （UBMS）
diamond-like carbon （DLC） films
anti-reflection
orthogonal experiment
