期刊文献+

基于莫尔信号的精密位移测量与控制的研究 被引量:1

Research on precision displacement measurement and control using moiré signals
原文传递
导出
摘要 应用光衍射理论分析了一种纳米级位移分辨率的双级衍射光栅测量系统,建立了衍射莫尔信号与对应位移的数学模型,并通过计算机仿真对莫尔信号的位移特性进行了研究。在此基础上构建了一套精密位移测量与控制装置,取差动零次激光莫尔信号为控制信号,由微机控制实现高精度位移检测及全自动精密定位。实验结果表明,基于激光莫尔信号的精密检测与控制装置可获得得5nm的位移分辨率及±0.4μm的定位精度。 A double-grating displacement measurement system with the resolution of nanometer order was analyzed using diffractive theory. A mathematic model of the double-grating displacement measurement was established. The characteristics of laser moiré signals was studied by numerical simulation of moiré signals. A precision measuring and positioning device based on diffraction gratings was designed . The device achieved precision displacement measurement and automatic precision alignment using computer controlled moiré technique. The experimental result shows that the apparatus based on moiré signal can achieve the resolution of 5um and plane positioning accuracy of ± 0.4μm.
出处 《光学技术》 CAS CSCD 北大核心 2005年第5期701-703,共3页 Optical Technique
基金 江苏省高校自然科学基金资助项目(04KJB510073)
关键词 光学测量 莫尔信号 精密定位 自动控制 optical measurement moir6 signals precision alignment automatic control
  • 相关文献

参考文献9

  • 1Uchida Y, Hattori S, Nomura T. An automatic mask alignment technique using moiré interference[J]. Journal of Vacuum Science and Technology, 1987, B5:244-247.
  • 2Kanjilal A K, Narain R, Sharma R, et al. Automatic mask alignment without a microscope[J]. IEEE Transactions on Instrumentation and Measurement, 1995,44(3):806-809.
  • 3Furehasi H, Liu J, Uchida Y. Influences of the inclination of gratings for the alignment accuracies in moiré alignment systems[J]. Trans IEE of Japan, 2000,120C(12):75-80.
  • 4Itoh J, Kanayama T. Optical heterodyne detection of mask to wafer displacement for fine alignment[J]. Japanese Journal of Applied Physics, 1986,25(8):684-686.
  • 5Singh B P, Goto T, Sharma R, et al. Tracking and dynamic control of the angular alignment Position in a photolithographic mask aligner by moiré interference technique[J]. Review of Scientific Instruments, 1995, 66( 3 ):2685-2660.
  • 6Liu J, et al. Automatic mask alignment in the θ direction using moiré sensors[J].Nanotechnology,1995,6(4) :135-138.
  • 7饭土冢启吾.光学工程学[M].北京:机械工业出版社,1982..
  • 8张善锺.计量光栅技术[M].北京:机械工业出版社,1985.5-53.
  • 9林德教,吴健,殷纯永.具有纳米级分辨率的超精密定位工作台[J].光学技术,2001,27(6):556-557. 被引量:25

二级参考文献7

共引文献45

同被引文献7

  • 1陈小桥,袁兴娟,陈晓东.深亚微米集成电路设计中的互连线延迟问题[J].电子与封装,2005,5(3):29-32. 被引量:2
  • 2侯立刚 罗仁贵 宋云扬 等.超低功耗光栅检测系统芯片.测试技术学报,2006,20:53-56.
  • 3YOUNG F Y,WONG D F,YANG H H.Slicing floorplans with boundary constraints[J].IEEE Trans Comp Aid Des Integr Circ and Syst,1999.18(9):1385-1389.
  • 4AJAMI A H,BANERJEE K,MEHROTRA A,et al.Analysis of IR-drop scaling with implications for deep submicron P/G network designs[C] // In:Proc 4th Int Symp Qual Elec Des.San Jose,CA,USA.2003:35-40.
  • 5CHEN P H.Beat the competition:a knowledge-based design process addressing the antenna effect and cell placement[J].IEEE Circ and Dev Magaz,2004.20(3):18-27.
  • 6NISHIGUCHI N.An advance RTL to GDS2 design methodology for 90 nm and below system LSI's to solve timing closure,signal integrity and design for manufacturing[C] // In:Proc IEEE Int Symp Circ and Syst.Kobe,Japan.2005.6:5938-5941.
  • 7卢国纲.现代光栅测量技术[J].世界制造技术与装备市场,2002(5):10-13. 被引量:13

引证文献1

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部