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用于40Gb/s光电子器件的新型低成本硅基过渡热沉 被引量:1

A Novel Low-Cost Wideband Si-Based Submount for 40Gb/s Optoelectronic Devices
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摘要 提出了一种新型低成本硅基过渡热沉,用以实现高达40Gb/s的高速光电子器件封装.采用高阻硅衬底作为热沉基底,制作出了0~40GHz范围内传输损耗小于0.165dB/mm的共面波导传输线.热沉中采用Ta2N薄膜电阻作为负载以实现器件的阻抗匹配,达到了0~40GHz范围内低于-18dB的宽带低反射特性.和传统硅基平台相比,新型硅基热沉更具有制作工艺简单、导热性能良好等优点.为了证明其实用性,热沉被应用于高速电吸收调制器的管芯级封装测试,获得了超过33GHz的小信号调制带宽特性,在硅基热沉上首次实现可用于40Gb/s系统的光电子器件. A novel low-cost wideband Si-based submount is proposed and fabricated for 40Gb/s optoelectronic devices. In the submount,a CPW transmission line is directly formed on a high-resistivity Si substrate and exhibits a transmission loss as low as 0. 165dB/mm up to 40GHz. The submount contains a Ta2 N thin-film resistor for impedance matching, and a low reflection coefficient of less than -18dB up to 40GHz is achieved. Such a configuration has the advantages of simplified fabrication procedures and efficient heat dissipation. As a demonstration,the Si-based submount is used in a high-speed electroabsorption (EA) modulator for chip-level packaging. The small-signal modulation bandwidth is measured to be over 33GHz,which is the first report of 40Gb/s optoelectronic devices on a Si-based submount.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第10期2001-2005,共5页 半导体学报(英文版)
基金 国家自然科学基金(批准号:60244001 60223001和60290084) 国家高技术研究发展计划(批准号:2001AA312190和2002AA31119Z) 国家重点基础研究发展规划(批准号:G2000036601)资助项目~~
关键词 宽带硅基过渡热沉 高速电吸收调制器 高阻率硅衬底 低损耗共面波导 薄膜电阻 wideband Si-based submount high-speed EA modulator high-resistivity Si substrate low-loss CPW transmission line thin-film resistor
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参考文献12

  • 1Lindgren S,Ahlfeldt H,Kerzar B,et al.Packaging of high speed DFB laser diodes.22nd European Conference on Optical Communication,1996,1:97.
  • 2Henderson R M,Katehi L P B.Silicon-based micromachined packages for high-frequency applications.IEEE Trans Microw Theory Tech,1999,47(8):1563.
  • 3潘存海,李俊岳,花吉珍,王少岩.用于半导体激光器热沉的金刚石膜/Ti/Ni/Au金属化体系的研究[J].Journal of Semiconductors,2003,24(7):737-742. 被引量:3
  • 4Mino S,Ohyama T,Hashimoto T,et al.High frequency electrical circuits on a planar lightwave circuit platform.J Lightwave Technol,1996,14(5):806.
  • 5Ternent G,Ferguson S,Borsofoldi Z,et al.Coplanar waveguide transmission lines and high Q inductors on CMOS grade silicon using photoresist and polyimide.Electron Lett,1999,35(22):1957.
  • 6Reyes A C,El-Ghazaly S M,Dorn S,et al.Silicon as a microwave substrate.Digest of IEEE MTT-S International Microwave Symposium,1994,3:1759.
  • 7Taub S R,Young P.Temperature dèpendent performance of coplanar waveguide(CPW) on substrates of various materials.Digest of IEEE MTT-S International Microwave Symposium,1994,2:1049.
  • 8Reyes A C,El-Ghazaly S M,Dom S J,et al.CoPlanar waveguides and microwave inductors on silicon substrates.IEEE Trans Microw Theory Tech,1995,43(9):2016.
  • 9Morabito J M,Thomas J H,Lesh N G.Material characterisation of Ti-Cu-Ni-Au(TCNA)-a new low cost thin film conductor system.IEEE Trans Parts,Hybrids and Packaging,1975,11(4):253.
  • 10Katz A,Pearton S J,Nakahara S,et al.Tantalum nitride films as resistors on chemical vapor deposited diamond substrates.J Appl Phys,1993,73(10):5208.

二级参考文献12

  • 1Brown W D,Beera R A,Naseem H A,et al. Surf Coat Technol, 1996,86~87 : 698.
  • 2Katz A, Wang K W, Baiocchi F A, et al. Mat Res Soc Sym Proc,1992,260:889.
  • 3Pan C H,Xu Y H,Wang S Y,et al. Chinese J Synthetic Crystals ,2000,29 (3) :285.
  • 4Gu Changzhi, Jin Zengsun, Lii Xianyi, et al. Chinese Journal of Semiconductors, 1997,18 (11):840
  • 5Bachi A,Kolawa E,Vandersande J W,et al. A novel metallization scheme for diamond. 3rd Inter Conf on Application of Diamond Films and Related Materials,Geithersburg (USA),1995:157.
  • 6Meyyappan H, Malshe A P,Naseem H A, et al. Thin Solid Films, 1994,253 : 407.
  • 7Katz A,Lee C H,Tai K L. Materials Chemistry and Physics,1994,37 ~303.
  • 8Qu Xinping, Ru Guoping,Liu Jianhai ,et al. Chinese Journal of Semiconductors, 2000,21 (2) : 197
  • 9Su Ge,Wen Lishi,Cheng Huiming. Material Science & Technology, 1998,6(4): 22
  • 10Boudreaux J. Thermal aspects of high performance packing with synthetic diamond. 3rd Inter Conf on Application of Diamond Films and Related Materials, Geithersburg (USA),1995:603.

共引文献2

同被引文献6

  • 1Ido S, Tanaka T, Suzuki M, et al. Ultra-high-speed multiple-quantum-well electro-absorption optical modulators with integrated waveguides [ J ]. J. Lightwave Technol. , 1996, 14(9) :2 026-2 034.
  • 2Chou H F,Bowers J E. High-speed OTDM and WDM networks using traveling-wave electroabsorption modulators [J ]. IEEE J. Sel. Top. Quantum Electron. , 2007, 13(1): 58-69.
  • 3Kawano K,Kohtoku M, Ueki M, et al. Polarisation- insensitive traveling-wave electrode electroabsorption (TW-EA) modulator with bandwidth over 50 GHz and driving voltage less than 2 V [J]. Electron. Lett. , 1997, 33(18),1 580-1 581.
  • 4Zhang S Z, Chiu Y J, Abraham P, et al. 25-GHz polarization-insensitive electroabsorption modulators with traveling-wave electrodes [J]. IEEE Photon. Technol. Lett. , 1999, 11(2):191-193.
  • 5Fukano H, Yamanaka T, Tamura M. Design and fabrication of low-driving-voltage electroabsorption modulators operating at 40 Gb/s[J]. J. Lightwave Technol. , 2007, 25(8):1 961-1 969.
  • 6Bouchriha F, Dubue D, Bourrier D, et al. High Q- factor of coplanar waveguide on low-k polymer layer [C]. Proc. of 35th European Microwave Conference, 2005, 2:4-6.

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