反应溅射TiO/AlO和TiN/AlN薄膜的微结构与力学性能

Microstructure and Mechanical Property of TiO/AlO and TiN/AlN Films Synthesized by Reactive Sputtering

采用Ti-Al镶嵌复合靶在Ar、N2和O2混合气体中反应溅射制备了一系列TiO/AlO和TiN/AlN薄膜,并采用EDS、XRD、TEM、AFM、SEM和微力学探针研究了薄膜的化学成分、微结构和力学性能.结果表明,随氧分压的提高,TiO/AlO和TiN/AlN薄膜中的氧含量逐步增加,氮含量相应减少,但其(Ti+Al):(O+N)仍保持约为1:1的化学计量比.薄膜保持与(Ti,Al)N薄膜相同的NaCl结构,并形成强烈(200)织构的柱状晶.与此同时,TiO/AlO和TiN/AlN薄膜的硬度和弹性模量也仍保持在与TiN/AlN薄膜相当的35GPa和370～420GPa的高值.由于薄膜中形成了相当含量的氧化物,这类薄膜的抗氧化能力有望得到提高.

A series of （TiO/AlO and TiN/AlN） films were synthesized in a gaseous mixture of Ar, N2 and O2 by reactive sputtering method using a Ti-Al mosaic target. EDS, XRD, TEM, AFM, SEM and nanoindentation were employed to investigate the chemical composition, microstructure and mechanical properties of the films. Experiment results show that with the increase of O2 partial pressure, O content in the films increases and N content decreases correspondingly; while the atom ratio, （TiO/AlO and TiN/AlN） keeps in a stoichiometric constant of 1： 1 （TiO/AlO and TiN/AlN） films present a NaCl structure, the same as that of （TiN/AlN） film and columnar crystals showing a sharp （200） texture form in these films. Meanwhile, hardness and elastic modulus of TiN/AlO and TiN/AiN films maintain 35GPa and 370 -420GPa respectively, as high as those of TiN/AlN film. Oxidation resistance ability of this kind of films is hopeful to be significantly enhanced because a certain quantity of oxidizes come into being.