不锈钢衬底的抛光处理对碳纳米管薄膜场发射性能的影响(英文)

Influence of Polishing Process of Stainless Steel Substrates on Field Emission Properties of Carbon Nanotube Films

在抛光的和未抛光的不锈钢衬底上,利用微波等离子体化学气相沉积(MPCVD)方法从甲烷和氢气的混合气体中沉积碳纳米管薄膜,并对其场发射性能进行了研究。实验发现,不锈钢衬底的机械抛光能降低碳纳米管膜的开启场强,增大它的发射电流密度。在同一场强7.5 V/μm下,衬底未抛光样品的电流密度为2.9 mA/cm2,而衬底抛光样品的电流密度达到5.5 mA/cm2。低开启场强和大发射电流密度意味着β增大,说明机械抛光能使碳纳米管膜的β增大。

Carbon nanotubes （CNTs） were synthesized directly on stainless steel plates by microwave plasma enhances chemical vapor deposition （MPCVD） with methane and hydrogen gas mixture. The experimental results show that the polishing process of substrates can induce a lower turn-on field and improve its emission current density. For the field emission properties of CNTs, the current density of the un-pretreated sample is about 2.9mA/cm^2 , but 5.5 mA/cm^2 for the polished sample when the electric field of 7.5V/μm was used. Its lower turn-on electric field and larger emission current density are related to the larger field enhancement factor ft. The polishing pretreatment of substrate probably induces the increasing of β factor.