阴极电弧沉积技术及其发展

Cathodic Arc Plasma Deposition as a Coating Technique and its Development

本文分析了阴极电弧等离子沉积技术，以及有关的机理和应用。与其它物理气相沉积技术也作了定性和定量的比较。特别强调了重要的技术方面和最近的发展。

AbstractThis article analyzes the present status of cathodic arc plasma deposition. The fundamentals and applications of cathodic arc plasma deposition are reviewed. Quantitative and qualitative comparisons are carried out with other physical vapour deposition techniques. In this review I emerging aspects and recent developments of the technology are emphasized.