Cr和CrT底层对CoCrPt薄膜介质的磁和结构性能的影响(英文)

Effect of Cr and CrTi Underlayers on Magnetic and Structural Performances of CoCrPt Thin Film Media

为了改善记录介质的磁性能,研究了溅射Cr和CrTi底层对Co68Cr17Pt15性能的影响。发现在玻璃盘基和CoCrPt磁性层之间引入100nm厚的Cr底层,可使介质矫顽力从56kA·m-1增加到127kA·m-1,同时剩磁比和矫顽力矩形比分别增加66%和74%。同时还发现Cr底层厚度对介质磁性能有较大影响。考虑到减小Cr底层和磁性层的晶格匹配,在Cr底层里添加Ti元素,当Ti原子分数达到1.5%时,即使在室温下溅射,薄膜也有好的面内磁滞回线,此时矫顽力可达到160kA·m-1。X射线衍射表明在介质中引入Cr和CrTi底层,由于薄膜能更好的沿着垂直于易磁化轴方向生长而使介质性能提高。

The effect of sputtering Cr or CrTi underlayers on the performances of Co68Cr17Pt15 thin films were studied to improve the magnetic properties of recording media. It is found that the coercivity Hc is increased from 56 kA·m^-1 to 127 kA·m^-1, squareness S and coercive squareness S^＊ are increased to 66% and 74%, respectively, by incorporating the 100 nm-thick Cr underlayer between the CoCrPt magnetic layer and glass substrate, and that the Cr underlayer thickness has greater effect on the magnetic properties. In order to reduce the lattice mismatch between the Cr underlayer and the magnetic layer, the Cr underlayer was doped with Ti element. When Ti content is 15 at%, the film has square in-plane loop and the coercivity can reach 160 kA·m^-1 even under the condition of sputtering at the room temperature. The X-ray diffraction data show that the enhancement of coercivity and improvement of S and S^＊ should be attributed to the favorable film growth along the orientation perpendicular to the magnetization axis by introducing Cr or CrTi underlaver in the media.