连续多试样纳米金刚石膜沉积设备及工艺

Continuous-Deposition System and Process of Nanocrystalline Diamond Film for Multiple-Substrate

首先对热丝化学气相沉积(Chem ica l vapor depos ition,CVD)系统进行改造,设计了在真空室外对室内试样进行操纵的机械手系统和储料台,实现了一次热丝碳化后完成多个不同工艺条件下试样的连续沉积。有限元仿真研究结果表明,多衬底温度场比较均匀,适合于金刚石膜的生长。最后,采用改进沉积系统,在A r-CH4-H2气氛中,在多晶钼衬底上成功制备了纳米金刚石薄膜。R am an,XRD和AFM等结果表明,制备的金刚石纯度较高,晶粒大小在30 nm左右,表面光滑。

The existed hot filament chemical vapor deposition （HFCVD） system is improved. A manipulator system and a sample storing unit are designed so that substrates in the vacuum chamber can be moved from the outside of the chamber. As a result, the continuous deposition can be realized for different substrates under different conditions after only one time of the hot filament carbonization. Simulation results of FEM show that the temperature distribution is uniform in the multiple-substrate system and suitable for the nanocrystalline diamond film deposition. Finally, by the improved HFCVD system, nanocrystalline diamond films are prepared on polycrystalline molybdenum substrates in Argon-Methane-Hydrogen atmosphere. Results of Raman, SEM, XRD and AFM show that the prepared nanocrystalline diamond films have high purity with the grain size of 30nm and the smooth surface.