具有大比例表面界面原子的纳米SnO_2的合成与表征

Synthesis and characterization of nanometer SnO_2 with high ratio surface-interface atoms

采用络合沉淀法制备了纳米四方相SnO2颗粒,并对制备机理和颗粒结构和性质进行了实验研究。结果表明,反应过程中由于加入和释放出的有机物在纳米颗粒形核时起到了空间位阻的作用,避免了颗粒的迅速长大和团聚,而且在纳米SnO2形核时造成了缺氧环境,导致沉淀产物配位数不足,表面界面原子在颗粒原子总数中比例较高。XRD和TEM结果显示,纳米SnO2颗粒分布均匀。拉曼散射研究结果表明,10 nm的颗粒只有表面界面原子的贡献,未发现有体相原子的贡献。

Preparing mechanism and structural properties of nanometer tetragonal SnO2 by chelating-precipitation method were reported. The organics have a space disturbing effect during nanosized particle nucleation. This effect can prevent particles from enlarging and aggregation and make an absent oxygen circumstance during nanosized SnO2 nucleation. Consequently, the coordination number in precipitate is less and the surface-interface atoms are more than those in normal precipitated processing. The XRD and TEM characterization results indicate that the particle distribution of nanosized SnO2 is uniform. The Raman measuring results suggest that phonons contribution of surface-interface atoms can be found in 10 nm particles only.