摘要
目的在金属钛表层制备以氮化钛(TiN)为主的氮化物膜层。方法在片状(25.0 mm×3.0 mm×0.5 mm)纯钛试样表层用辉光离子渗氮法制备了以TiN为主的氮化物膜层。利用X射线衍射(XRD)、原子力显微镜(AFM)分析表征了样品膜层的物相组成、膜层微观结构及膜层硬度。结果在820℃,600 Pa炉压下,通过辉光等离子渗氮4 h左右,可以在金属钛试样表面生成一层厚度约3μm、均匀致密的金黄色氮化钛膜层,膜层主要由面心立方结构的TiN组成,膜层呈胞状结构生长,膜层硬度为24 GPa。结论采用辉光离子氮化处理工艺可以在金属钛表面制备连续、致密、无裂缝、表面相对光滑的TiN保护层。
Objective To synthesize the surface film which consisted of TiN on pure titanium. Methods The glow ion nitriding technique was used to synthesize the surface film consisting of TiN on sheet-shaped （25.0 mm× 3.0 mm× 0.5 mm） pure titanium sample. The surface phase constitution, microstructure and microhardness were investigated by XRD and AFM. Results It showed that the golden TiN surface film with the thickness of 3μm could be formed using glow ion nitriding technique under the condition of 820 ℃, 600 Pa for 4 hours. The surface film was composed of TiN with F. C. C structure and grew with the cell-shaped structure, and its microhardness was about 24 GPa. Conclusion The glow ion nitriding technique is a feasible method to the synthesis of high quality TiN surface film on titanium.
出处
《口腔医学》
CAS
2005年第5期306-308,共3页
Stomatology
基金
南京医科大学科技发展基金资助项目(NY03073)
