摘要
本文详细论述了动态目标发生器圆鼓图形光学刻划掩模板的设计思想及其制作过程,经试刻效果良好.为非球面光刻掩模板的制作开创了一条新途径。
This paper describes design idea of mask manufacture of dynamic aim generator imageand its mading process.It was used in experimental lithography and got a better result.Anew method was found for the manufacture of nonglobal mask.
出处
《光学精密工程》
EI
CAS
CSCD
1996年第1期29-32,共4页
Optics and Precision Engineering
关键词
动态目标发生器
掩模板
光刻
Dynamic aim generator,Drum image,Photolithography,Mask