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Modeling and Simulation of Photoelectronic Lambda Bipolar Transistor 被引量:1

Modeling and Simulation of Photoelectronic Lambda Bipolar Transistor
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摘要 Based on the region model of lambda bipolar transistor ( LBT), a dividing region theory model of PLBT is set up,simulated and verified. Firstly, the principal operations of different kinds of photoelectronic lambda bipolar transistor ( PLBT) are characterized by a simple circuit model. Through mathematical analysis of the equivalent circuit, the typical characteristics curve is divided into positive resistance, peak, negative resistance and cutoff regions. Secondly, by analyzing and simulating this model, the ratio of MOSFET width to channel length, threshold voltage and common emitter gain are discovered as the main structure parameters that determine the characteristic curves of PLBT. And peak region width, peak current value, negative resistance value and valley voltage value of PLBT can be changed conveniently according to the actual demands by modifying these parameters. Finally comparisons of the characteristics of the fabricated devices and the simu- lation results are made, which show that the analytical results are in agreement with the observed devices characteristics. Based on the region model of lambda bipolar transistor ( LBT), a dividing region theory model of PLBT is set up.simulated and verified. Firstly, the principal operations of different kinds of photoelectronic lambda bipolar transistor ,( PLBT) are characterized by a simple circuit model. Through mathematical analysis of the equivalent circuit, the typical characteristics curve is divided into positive resistance, peak, negative resistance and cutoff regions. Secondly. by analyzing and simulating this model, the ratio of MOSFET width to channel length, threshold voltage and common emitter gain are discovered as the main structure parameters that determine the characteristic curves of PLBT. And peak region width, peak current value, negative resistance value and valley voltage value of PLBT can be changed conveniently according to the actual demands by modifying these parameters. Finally comparisons of the characteristics of the fabricated devices and the simulation results are made, which show that the analytical results are in agreement with the observed devices characteristics.
出处 《Transactions of Tianjin University》 EI CAS 2005年第5期348-352,共5页 天津大学学报(英文版)
基金 Supported by "973" National Key Basic Research Program ( No. 2002CB311905).
关键词 silicon photoelectronic negative resistance device bipolar transistor device modeling 双极晶体管 负电阻 PLBT 电路模型 参数设置
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  • 2Gorman C B,Carroll R L,Fuierer R R. Negative differential resistance in patterned electroactive self-assenrbled monolayers [C]// Langmuir,2001,17 : 6923-6930.
  • 3Gaudioso J,Lauhon L J,Ho W. Vibrationally mediated negative differential resistance in a single molecule[C]// Physical Review Letters,2000,85 (9) : 1918-1921.
  • 4Yamamoto T,Morimoto M. Thin-MIS-structure Si negative resistance diode [J]. Applied Physics Letters, 1972,20 (8) : 269- 270.
  • 5Guisinger N P,Greene M E,Basu R,Baluch A S,Hersam M C. Room temperature negative differential resistance through Individual organic molecules on silicon surfaces [J]. Nano Letters,2004,4( 1 ) :55-59.
  • 6张培宁,张以谟,郭维廉,郑云光,李树荣,梁惠来,张世林.PLBT硅光电负阻器件及光控正弦波振荡器[J].天津大学学报,2000,33(2):252-254. 被引量:1

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