非晶态Tb-Fe硅基薄膜超磁致伸缩特性研究

Study on the magnetostriction of amorphous Tb-Fe silica baseplate thin film

本文研究由溅射法制备的非晶态Tb-Fe硅基薄膜在室温下的磁致伸缩特性,从中找到一种在低磁场下仍具有较大磁致伸缩性的材料。研究结果表明:非晶态Tb-Fe薄膜,经450℃真空热处理,在其非晶相基础上可形成均匀细小的晶体颗粒,其磁致伸缩系数在49×104A.m-1的外磁场中可达380×10-6,并且λ随H的增大迅速提高,具有良好的软磁特性,符合预期的应用要求。

In this paper, we studied the magnetostriction of amorphous Tb-Fe silica baseplate thin film that prepared by sputtering at room temperature. Through this research we expect to find a kind of material which has large magnetostriction in low magnetic field, These results suggest that the magnetostriction of Tb-Fe thin film （through heat treatment to 450℃） reached the maximum values of 380×10^-6 at 49×10^4A·m^-1, and fast increased follow, It has very good combined magnetic properties.