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Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique 被引量:1

Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique
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摘要 Cu2O thin films with (111) preferred orientation have been grown on glass and Cu substrates by rapid thermal oxidation of Cu at 500℃ for 45s. The optical band gap energy was determined by spectral data of transmittance and absorbance to be 2.04eV. The electrical conductivity of grown films was measured around (1:1 × 10^-5Ω^-1cm^-1) at 300K. Thermoelectric power measurements of the film were carried out. Furthermore, the properties of these films are compared with properties of Cu2O obtained by other methods. Cu2O thin films with (111) preferred orientation have been grown on glass and Cu substrates by rapid thermal oxidation of Cu at 500℃ for 45s. The optical band gap energy was determined by spectral data of transmittance and absorbance to be 2.04eV. The electrical conductivity of grown films was measured around (1:1 × 10^-5Ω^-1cm^-1) at 300K. Thermoelectric power measurements of the film were carried out. Furthermore, the properties of these films are compared with properties of Cu2O obtained by other methods.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2005年第11期2977-2979,共3页 中国物理快报(英文版)
关键词 SINGLE-CRYSTAL THIN-FILMS CUPROUS OXIDE SINGLE-CRYSTAL THIN-FILMS CUPROUS OXIDE
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