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Sn—SnO_x薄膜的组织结构及湿敏性

ORGANIZATION FORM AND HUMIDITY SENSITIVITY OF Sn-SnO_x THIN FILM
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摘要 报道了一种制备Sn—SnOx湿敏薄膜的新工艺(VETO).首先在1mPa的真空下蒸发纯金属Sn质量分数999mg·g-1,衬底(Al2O3陶瓷基片)温度控制在150~250℃;蒸发的Sn膜在空气中缓慢氧化,即可获得湿度敏感的Sn—SnOx薄膜.利用XRD和SEM分析了膜的晶体结构和表面形貌环境湿度RH从11%变到97%肘,膜阻抗变化约三个量级,膜电导是电子电导和离子电导的混合.在低温区电子电导是主要的,在高温区离子电导占优势. new method (VETO) to prepare humidity sensitive film of Sn-SnOx has been reported.Firstly, pure tin (mass fraction 999mg/g) was evaporated on A12O3 ceramic substrates kept at 150~250℃in a pressure of 1 mPa. The humidity sensitive films could be got after the tin films were slowly oxidized in air.XRD and SEM were employed to analysis the structure and the surface microstructure. It is found that the impedance of the films changed about three orders of magnitude with changing the relative humidity from 11to 97%. The conductance mechanisms are both ionic and electronic.
出处 《材料研究学报》 EI CAS CSCD 1996年第1期73-76,共4页 Chinese Journal of Materials Research
关键词 薄膜 湿敏性 薄膜结构 半导体薄膜 氧化硒 evaporation thermal oxidation Sn-SnOx thin films humidity sensitivity
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参考文献2

  • 1黄敏明,金属氧化物及其催化作用,1991年
  • 2Kang W P,Sensors and Actuators,1987年,12卷,349页

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