摘要
本文用离子束技术，使铜网的二次电子发射系数降低，场发射性能得到改善，钼网的＂栅发射＂得到抑制。测量并讨论了逸出功变化对电子发射性能的影响，研究表明，离子束技术是改善材料电子发射性能的有效手段。
The improvement of the secondary electron emission coefficient and field emission characteristice of Cu,and suppression of emission from Mo grids by ion beam technology were investigated.The influence of work function on electron emission properties was measured and discussed.Results show that the ion beam technology is a prospective and practical process for improving the electron emission characteristics.
出处
《电子学报》
EI
CAS
CSCD
北大核心
1996年第2期89-91,共3页
Acta Electronica Sinica
基金
国家863高技术计划资助
