摘要
采用红外吸收光谱分析了SIPOS薄膜中Si-O键的结构,对比分析了热退火和快速灯光退火对SIPOS中Si-O键结构的影响,并结合SIPOS/Si结构的C-V、I-V测试结果,对该结构的异质结特性进行了分析。
SIPOS films are prepared and annealed both in heat and flashlight manners. Based on the infrared absorption spectrum of SIPOS films, properties of Si-O bonds in the films are analyzed. To study the properties of SIPOS/Si heterogeneous junctions, C-V and I-V measurement were made on the structures. By comparison, effects of annealing manners on properties of the SIPOS films and the SIPOS/Si heterojunctions are investigated.
出处
《微电子学》
CAS
CSCD
1996年第2期116-118,共3页
Microelectronics
关键词
SIPOS膜
热退火
异质结构
半绝缘
多晶硅
Semiconductor material
SIPOS film
Thermal annealing
Heterostructure