摘要
介绍了下一代光刻技术的演变,重点描述了浸没式光刻技术、极端远紫外光刻技术、纳米压印光刻技术和无掩模光刻技术的基本原理、技术优势、技术难点以及研发,并展望了这几种光刻技术的前景。
The evolution tages, disadvantages and Nanoimprint Lithography described. of the Next Generation Lithography(NGL) is R&D of Extreme Ultraviolet Lithography introduced. The principles, advan(EUVL) , Immersion Lithography, and Maskless Lithography (ML2) are stressed,and the prospects of them are
出处
《电子工业专用设备》
2005年第11期27-33,共7页
Equipment for Electronic Products Manufacturing