电子束光刻中邻近效应校正的几种方法

Methods of proximity effect correction in electron beam lithography

本文简要介绍了限制电子束光刻分辨率的主要因素之一—邻近效应的产生机制,列举了校正邻近效应的GHOST法、图形区密集度分布法和掩模图形形状改变法,介绍了每种方法的原理、步骤和效果,比较了它们各自的优缺点。

Proximity effect is one of the most important limitations to the resolution of electron beam lithography. The mechanism of proximity effect was introduced. Some correction methods of proximity effect such as GHOST, pattern area density map and shape modification were described in detail, including its principle, correction procedure and efficiency. The advantages and shortages of these methods were also given.