激光沉积法制备近红外高屏蔽性能透明薄膜

Pulsed Laser Deposition of High Anti-infrared Radiation Capacity Transparent Ag/Fe/Zn Oxide Multilayer Film

以金属锌、铁、银为靶材,用准分子脉冲激光沉积法(PLD),在石英玻璃基片上制备了锌、铁、银的金属氧化物多层薄膜.XRD和AFM研究结果表明薄膜的结晶度很好,晶粒尺寸在30～50 nm,成膜均匀致密,光滑平整;经紫外和红外光谱发现:Ag/Fe/Zn氧化物多层膜反射率小于15%,是一种低反射薄膜,其在可见光区的透过率约为50%(浅蓝灰色),对紫外的阻隔率大于90%,对近红外的阻隔率大于70%.

Anti-infrared and ultraviolet radiation Ag/Fe/Zn oxide multilayer film was deposited on quartz glass substrates by pulsed KrF excimer laser ablation of metal targets in oxygen atmosphere. Different metals （zinc, iron, silver） were used in order to achieve a high anti-infrared and ultraviolet radiation capacity in the deposited thin film. Their composition and structure were identified by XRD and AFM. The anti-infrared/ultraviolet property was characterized by UV-VIS and FTIR in the wavelength range of 190-2500 nm. Our experimental results demonstrated an improved anti-infrared/ultraviolet property of Ag/Fe/Zn oxide muhilayer film as well as good diaphaneity. In visible spectrum, its transmittance was greater than 50% . In ultraviolet region, the transmittance lowered to 10% . Meanwhile, the transmittance was 26.7% in near infrared wave range.