湿法腐蚀硅制作PDMS微流控芯片

FABRICATION OF PDMS MICROFLU-IDIC CHIP BY WET ETCHING SILICON

提出一种制作聚二甲基硅氧烷(PDMS)微流控芯片的方法。用15%四甲基氢氧化铵溶液各向异性腐蚀硅(100)制作模具,然后经过浇模,中真空键合得到PDMS微流控芯片。整个过程耗时约10h。用SEM和激光共焦显微成像系统观察整个制作过程。分析了硅片模具及PDMS微流控芯片图案的一致性及粗糙度,结果表明硅片模具图案的相对标准偏差低于3%,表面粗糙度Ra是0.0.51μm,PDMS微流控芯片相应的分别是1%和0.183μm。用PDMS微流控芯片进行电泳分离试验,分离场强200V/cm,在4.7cm长的分离通道中,30s内成功分离了四苯磺酸基卟啉(TPPS)和羧基钴酞菁(TCPcCo(Ⅱ))的混合样品。

A method is developed to fabricate polydimethylsiloxane （PDMS） microfluidic chip. After making the casting mould by anisotropy etching silicon（100） with 15% （CH3）4NOH, PDMS microfluidic chip can be get by casting and middle vacuum bonding. All procedures are finished in about 10 h. The whole process is monitored by SEM or confocal microscope. The relative standard deviation of micropattems of the silicon mold and PDMS microfuidic chip are under 3% and 1%, the smoothness is 0.051 μm and 0.183 μm respectively. Electrophoresis separation is carried out on the fabricated PDMS microfiuidic chip. Been applied 200 V/cm electric field, the mixture of TPPS and TCPcCo（ Ⅱ ） is successfully separated within 30 s in 4.7 cm long channel.