(Pb,La)TiO_3铁电薄膜微结构与制备工艺研究

Investigation of micro-structure and preparation process of(Pb,La)TiO_3 thin films prepared by RF sputtering

采用射频磁控溅射技术在室温淀积、其后在700℃下退火10min,制备了(Pb,La)TiO3(简记为PLT)铁电薄膜。利用XRD研究了薄膜的结晶性;利用XPS研究了薄膜表面的化学成分、组分以及表面原子的化学价态;利用SEM研究了薄膜的断面。薄膜结构分析结果表明,在一定的制备工艺条件下,薄膜制备时间的长短对薄膜结晶性能的影响不大;XPS波谱分析表明,所测得的元素有Pb、La、Ti、O和C,其中C元素是薄膜在制备或测试过程中的污染,薄膜中没有其它杂质元素;由断面的SEM分析可知,在本论文采用的制备工艺条件下,薄膜与基底之间基本上没有互扩散,薄膜与基底的界面比较清楚。

The （Pb,La）TiO3 [PLT] thin films were prepared at room temperature by RF magnetron sputtering technique, and annealed at 700℃ for ten minutes. The X-ray diffraction （XRD） patterns of the films were used for determining crystalline of the films. X-ray photoelectron spectroscopy （XPS） studies were used for determining the chemical composition, compositional depth profile, and the chemical bonding of the films,and the SEM images were used for observing the cross-section of the films. The experiment results show that the deposition duration has an minute influence on the crystalline structure of the films, the XPS analyses show that there was no evidence of impure elements except for C, the carbon on the surface of the films was due to contamination probably caused by handling or pump oil; and the cross section indicates that the interfaces between the film and substrate layers are quite clear.