摘要
采用CoCrPtNb四元合金作磁记录介质,并采用多层膜结构(CoCrPt)100-xNbx/CrTi/C/Glass制备玻璃盘基硬盘。实验结果表明:采用适宜厚度的籽晶层与合适组分的底层和磁性层的多层膜结构,即使在室温下溅射,此种薄膜磁记录介质也可得到高达260kA/m的矫顽力;在550℃高温下,经过30min真空退火后,其矫顽力有较大幅度提高,并在Nb含量为2.4%(原子分数)时达到极大值386kA/m,适用于高密度磁记录。同时,也详细分析了磁性层和底层组分、籽晶层厚度以及真空退火对磁记录介质磁性能和微结构的影响。
Hard disks of glass substrate have been fabricated by using C/（CoCrPt）100-xNbx/CrTi/C/glass multilayer structure and CoCrPtNb as magnetic recording media in this work, This result reveals that the coercivity He for this type of films can reach 260 kA/m due to the multilayer structure： the proper thickness of carbon seed layer, the optimized magnetic layer and the under layer of room temperature sputtering, which was annealed at 550℃ for 30 minutes under the vacuum condition. It is found that the coercivity of multilayer films increases abruptly, even to the maximum value of 386 kA/m when Nb content is 2.4 at%, which can be used for high-density magnetic recording media. We also analyzed the effects of processing parameters, such as the composition of magnetic layer and under layer, the thickness of seed layer and the vacuum annealing, on the properties and microstructure of thin films.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2005年第11期1802-1805,共4页
Rare Metal Materials and Engineering
基金
教育部博士学科点专项基金资助项目(20010487021)
