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C/W多层膜的制备及其光学特性 被引量：1

C/W Multilayer Growth and Its Optical Properties
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摘要 介绍了软X射线波段C/W多层膜的制备和光学性能检测。采用高真空直流磁控溅射方法在超光滑硅基片上制作了C/W多层膜,用X射线衍射(XRD)仪,小角测量方法测试多层膜的光学性能,采用透射电镜(TEM)观测多层膜断层样品的微观结构,并在同步辐射软X射线光束线上,测试了所制备的C/W多层膜样品的反射率,然后对测试结果进行拟合分析。结果表明,所制备的C/W多层膜样品的质量较高,界面清晰,粗糙度小,所有膜层均为无定形态,没有晶相生成,以44.2°入射在5.9 nm处有约6%的反射率。 Soft Xoray C/W multilayers, deposited on Si wafer by DC magnetron sputtering, were characterized with little angle X-ray diffraction（ LAXRD）, transmission electron microscopy（TEM）. Its reflectivity was measured with X-ray generated by electron synchrotron radia- tion and analyzed with data fitting. The results show that the C/W multilayers have smooth surface and well-defined sharp interfaces. No crystal- lization was found to exist in all constituent amorphous C and W layers.The reflectivity of the multilayer is about 6% at an incident angle of 44.2° and a wavelength of 5.9 nm.
作者 王风丽 王占山 王洪昌 吴文娟 张众 张淑敏 秦树基 陈玲燕
机构地区 同济大学精密光学工程技术研究所
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2005年第5期385-387,共3页 Chinese Journal of Vacuum Science and Technology
基金 国家自然科学基金资助(No.10435050 No.60378021)
关键词 磁控溅射 多层膜 X射线衍射仪 透射电镜 同步辐射 Magnetron sputtering, Multilayer film, X-ray diffractometer, Transmission electron microscope,Synchrotron radiation
分类号 O43 [机械工程—光学工程] TB7 [一般工业技术—真空技术]
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共引文献18

同被引文献13

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真空科学与技术学报
2005年 第5期

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