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下一代实用光刻技术——纳米压印技术 被引量:9

The Next Generation Lithography: Nanoimprint Lithography
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摘要 详细介绍了纳米压印技术的应用前景,对目前各种纳米压印工艺进行归纳、分类。通过 对不同工艺过程的深入比较,分析了它们的优缺点,并展望了各自的应用前景。 Multifarious nanoimprint lithography are particularly described in this paper. All these techniques have been classified according to their mold characters. Their advantages and disadvantages are shown, each potential application in microstructures fabrication domain has been discussed.
出处 《机电一体化》 2005年第6期14-19,共6页 Mechatronics
关键词 纳米压印技术 微接触印刷法 热压印 工艺比较 nanoimprint lithography micro contact print hot embossing lithography technology compare
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参考文献8

  • 1Chou S Y, Kelmel C. Ultrafast and Direct imprint of Nanostructures in Silicon. Nature,2002,417 (20) :835 ~ 838.
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