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Phosphosilicate glass film for optical waveguide by sol-gel method

Phosphosilicate glass film for optical waveguide by sol-gel method
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摘要 In this paper, silica-on-silicon erbium-doped phosphosilicate glass film material was fabricated for optical waveguides by sol-gel method. Samples were characterized and analyzed. It is demonstrated that we have got well-distributed, good translucent, alterable thickness of film and glass state erbium-doped phosphosilicate films material for optical waveguides by sol-gel method. In this paper, silica-on-silicon erbium-doped phosphosilicate glass film material was fabricated for optical waveguides by sol-gel method. Samples were characterized and analyzed. It is demonstrated that we have got well-distributed, good translucent, alterable thickness of film and glass state erbiumdoped phosphosilicate films material for optical waveguides by sol-gel method.
出处 《Optoelectronics Letters》 EI 2005年第2期121-123,共3页 光电子快报(英文版)
基金 This work was funded by National Emphases Basis Research andProgramming Project of China (3B8000061038) and InnovationFoundation of Jilin University (450011022214) .
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