提高高频离子源性能的研究

The study of the improving the quality RF ion source

研制了一台4MV静电加速器用高频离子源;测试并分析了振荡器板压、离子源气压和引出电压对离子束品质的影响;在575V板压、7.7×10-4Pa气压、1.6kV引出电压和21kV聚焦电压的状态下,得到了束流为169μA、质子比为88%的稳定离子束.

A RF ion source for a 4MeV electrostatic accelerator is prepared. The influence of plate voltage of the oscillator, gas pressure and extraction voltage on the quality of ion beam is determined and analysed. A stable ion beam, which intensity is 169μA and the proton ratio is 88%, is obtained under the condition of the plate voltage of 575 V, the gas pressure of 7.7 × 10^-4pa, the extraction voltage of 1.6kV and the focusing voltage of 21kV.