期刊文献+

磁制冷材料表面保护膜附着性能的研究 被引量:3

Study on the Adhesion Property of Surface Protective Films on the Magnetic Refrigerant Materials
下载PDF
导出
摘要 利用直流磁控溅射技术在Gd基体上分别镀不锈钢和Ti。用扫描电镜(SEM)、能谱仪、XPS对薄膜表征,用引拉法测定了薄膜的附着强度。结果表明:采用溅射法在Gd基体上镀膜表面质量好,膜基界面结合良好,附着强度大(15MPa)。 Gd substrates were differently coated with Ti and 1Cr18Ni9Ti by means of DC magnetron sputtering technology. The characteristics of the films have been investigated by scanning electron microscopy (SEM), EDS, X-ray photoelectron spectroscopy(XPS), and the adhesion of films were tested by tension test. The results show that the surfaces of films are smooth and perfect, the interferences between Gd and films join together strongly, and the adhesion strength is larger than 15MPa in these tests.
出处 《表面技术》 EI CAS CSCD 2005年第6期19-21,共3页 Surface Technology
基金 国家十五863基金资助项目(2002AA324010)
关键词 磁控溅射 附着性 界面 磁制冷材料 Magnetron sputtering Adhesion Interference Magnetic refrigerant materials
  • 相关文献

参考文献13

  • 1Zimm C, Jastrab A, Gschneidner K,et al. Description and performance of a near-room temperature magnetic refrigerator[J].Advances in Cryogenic Engineering, 1998, 43: 1957-1968.
  • 2郝春,肖素芬,杨涛.钼酸盐及其复配盐对水中钆的缓蚀作用[J].四川化工与腐蚀控制,2003,6(4):1-4. 被引量:5
  • 3张泽玉 龙毅 万发荣.一种室温磁制冷用缓蚀性热交换流体[P].中华人民共和国:CN1456633A.2003.
  • 4John D Brassle,William P Taylor,Bala Gamesh,et al. Solution hardened platinum alloy flexure materials for improved performance and reliability of MEMS devices[J].Micromech.Microeng,2005,15(1): 43-48.
  • 5Butilenko A K,Vovk A Y,Khan H R.Structural and electrical properties of cathodic sputtered thin chromium films[J].Surf.&Coat.Technol,1998,107:197-199.
  • 6Hashimoto K,Kumagai N,Yoshioka H. Resistant amorphous surface alloys[J].Corrosssion Science,1993,35(1-4):363-370.
  • 7Petkov K,Krastev V,Marinova T,et al.XPS analysis of thin chromium films[J]. Surf & Interface Analysis, 1992,18(7):487-490.
  • 8Gautier C,Machet J.Effects of deposition parameters on the texture of chromium films deposited by vacuum arc evaporation[J].Thin Solid Films,1996,289(1-2):34-38.
  • 9郑森林,张平余.涂层基结合强度测定方法研究进展[J].薄膜科学与技术,1993,6(2):85-92. 被引量:18
  • 10范洪远,向文欣,李伟,邱绍宇,李聪,张西鹏,应诗浩,沈保罗.膜厚对溅射铬膜与锆合金基体附着性的影响[J].核动力工程,2003,24(3):245-248. 被引量:4

二级参考文献8

  • 1Butilenko A K,Vovk A.Y Khan H R.Structural and Electrical Properties of Cathodic Sputtered thin Chromium Films[J].Surf.&Coat.Technol.,1998,107:197~199.
  • 2Hashimoto K,Kumagai N,Yoshioka H.Corrosion Re sistant Amorphous Surface Alloys[J].Corrosion Science,1993,35(14):363~370.
  • 3Gautier C,Moulard G,Chatelon J P.Influence of Substrate Bias Voltage on the in Situ Stress Measured by an Improved Optical Cantilever Technique of Sputtered Chromium Films[J].Thin Solid Films,2001,384:102~108.
  • 4Habazaki H,Mitsui H,Ito K.Roles of Aluminium and Chromium in Sulfidation and Oxidation ofSputer-Deposited Al-and Cr-Refractory Metal Alloys[J】.Corrosion Science,2002,44(2):285~301.
  • 5Misra A.,Nastasi M.Intrinsic Residual Stresses in Metal Films Synthesized by Energetic Particle Deposition,Nuclear Instruments and Methods in Physics Research,Section B:Beam Interactions with Materials and Atoms.2001,175—177:688~693.
  • 6Li X Y Akiyama E,Habazaki H.XPS Study of Passive Films on Corrosion-Resistant Cr-Zr Alloys Prepared by Sputter Deposition,Corrosion Science,1997,39(8):1365—1380.
  • 7Zhu Y F, Yao W Q, Zheng B. Application of AES Line Shape Analysis for the Identification of Interface Species during the Metallization of Diamond Particles[J].Surface and Interface Analysis, 1999, 28 (1): 254-257.
  • 8王晓伟,周柏青,李芹.循环冷却水处理中钼酸盐的无机协同缓蚀剂[J].工业用水与废水,2002,33(6):19-21. 被引量:7

共引文献23

同被引文献26

引证文献3

二级引证文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部