摘要
在真空室内原位测量了磁控溅射超薄铝膜的电阻率和薄膜厚度之间的关系以及各种工艺参数对其影响，薄膜的不同厚度阶段，具有不同的导电特性。分析表明：表面和晶界对传导电子的散射是构成薄膜电阻率尺寸效应的原因．
The electric conductivity of sputtered ultrathin Al films as a function of thickness has been measured in situ during vacuum deposition process. At different stages of growth, the films have the different electric conductivity characteristics. Therotical analysis showed that surface scattering and grain boundary scattering played a main role in size effect of resistivity.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1996年第3期308-312,共5页
Acta Metallurgica Sinica
