含氦Ti膜的透射电镜研究

Transmission Electron Microscopy Research on Containing Helium Titanium Film

在氦气和氩气混合气氛中用磁控溅射法制备含氦Ti膜。应用透射电镜观察不同氦气和氩气流量比对Ti膜微观结构及氦泡形貌和分布的影响,并研究退火温度对氦泡聚集和长大行为的影响。研究观测到,Ti膜中氦泡的尺寸随氦流量的增加而增大,氦泡的密度随氦流量改变出现一最大值;温度低于0.5 Tm时,He泡以泡迁移和合并机制(MC)长大;温度高于0.5 Tm时,He从小泡离解,被大泡吸收,以OR机制长大,氦泡尺寸明显增加。

The magnetron sputtering method was used to prepare Ti film at helium and argon mixed atmosphere in order to introduce helium into the film. The influence of HeAr flux ratio on the Ti film microstructure was studied, and the influence of temperature on the evolution of helium bubbles was analyzed. The dimension of bubble increases with the increment of helium flux while there is a maximum for the bubble density during the process. When the temperature is lower than 0.5 Tm, helium cluster located in the interior of crystal grain congregates to form bubbles which are visible in TEM.The migration and coalescence of bubbles occur when the temperature is higher than 0.5Tm, while the size of helium bubble increases obviously.