电沉积法制备加速器生产^(109)Cd用Ag靶

Preparation of Ag Target for Producing ^(109)Cd by Electro-Deposition

采用电沉积法对加速器生产109Cd所用Ag靶的制备工艺进行研究。实验研究了电沉积过程中影响Ag靶层质量及厚度的主要因素,确定了Ag靶制备工艺条件和工艺参数:ρ(Ag+)=20~50 g/L,ρ(KNO3)=10~30 g/L,φ(NH4OH)=0.1~0.2;电流密度10~15 mA/cm2,电沉积时间2~3 h,室温。用此工艺条件制备出靶厚大于100 mg/cm2、表面光滑、镀层致密的Ag靶。

The preparation of the Ag target for producing ^109Cd by cyclotron using electro-deposition method is described. The effects of main process parameters on the performance and mass thickness of Ag target were studied, and suggested technological conditions are as follows： ρ（Ag^-）=20～50 g/L,ρ（KNO3） =10～30 g/L,ψ（NH4OH）= 0.1～0.2. By means of it, a well satisfied smooth and firm Ag target with a mass thickness of more than 100 mg/cm^2 can be prepared.