利用脉冲激光沉积技术在双轴织构的Ni基带上外延CeO_2薄膜

Pulsed laser deposition of epitaxial CeO_2 thin films onbiaxially textured Ni substrate

利用脉冲激光沉积技术在氢还原气氛下成功地在双轴织构的Ni基带上外延了高质量的CeO2薄膜.x射线衍射θ—2θ扫描和ω扫描结果表明,CeO2薄膜在Ni基带上呈c轴方向生长,存在很强的平面外织构;极图和φ扫描显示它具有良好的平面内织构.Ni基片上织构的CeO2薄膜为进一步在其上外延高质量的YBa2Cu3O7-x超导薄膜提供了很好的模板.

High-quality epitaxial CeO2 thin films were fabricated on the biaxially textured Ni substrates by pulsed laser deposition using a gas mixture of 4% H2 and 96% Ar. X-ray diffraction θ-2θ scan and ω-scan indicate the CeO2 thin films are c-axis textured, and φ-scan and pole figure of the films reveal the presence of good in-plane texture. The biaxially textured CeO2 films provide a good template for the fabrication of YBCO conductors.