Nb超导量子结中AlO_x－Al厚度对其特性的影响

The AlO_x-Al Thickness Influence on the Characteristic in Nb Superconducting Quantum Junction

通过阳极氧化电压谱图（ＡＶＳ）；Ｉ－Ｖ特性和Ｆｉｓｋｅ台阶电压测量，我们研究了Ｎｂ超导量子结构中ＡｌＯｘ－Ａｌ厚度对其特性的影响。发现ＡＶＳ中ＡｌＯｘ－Ａｌ与Ｎｂ电极之间的界面陡度和Ｉ－Ｖ特性取决于ＡｌＯｘ－Ａｌ厚度，Ｎｂ｜Ａ｜Ｏｘ－Ａｌ｜Ｎｂ结的最小最佳沉积Ａｌ层厚度为７ｎｍ。由Ｆｉｓｋｅ台阶电压，ＡＶＳ中的Ａｌ峰和Ｉ－Ｖ特性的畸变，证实了结中Ａｌ／Ｎｂ间由常态Ａｌ而引起的亲近效应的存在，并用ＭｃＭｉｌｌａｎ理论作了讨论。

The AlOx-￣Al thickness influence on the characteristic in Nb superconducting quantum junction was studied by measuring AVS, I-V characteristic and Fiske step voltage. It was discovered that the interface sharpness between the AlOx-Al and Nb in AVS and I-V Characteristic depends on the AlOx-Al thickness and the minimal optimum thickness of deposition Al layer is 7 nm. By comparing Fiske step voltage, the Al peak in AVS and distortion I-V characteristic it is confirmed that the proximity effect by normal Al between the AlOx and Nb is existent.The result was compared with the McMillan theory.