采用不同载气混合B_3N_3H_6原料制备B－N薄膜

Preparation of B-N Films by Remote Microwave Plasma Enhanced CVD from Borazine with Nitrogen,Hydrogen,and Argon

采用Ｎ２、Ｈ２和Ａｒ三种载气混合的Ｂ３Ｎ３Ｈ６原料，余辉微波等离子体增强化学气相沉积ＢＮ薄膜．通过漫反射富氏变换红外光谱，Ｋｎｏｏｐ硬度和附着性划痕试验分析薄膜的结构，成分和性能．结果表明，Ｎ２和Ｈ２混合的Ｂ３Ｎ３Ｈ６原料制备的薄膜具有ｃ～ＢＮ和ｈ－ＢＮ双相组织，Ａｒ混合的Ｂ３Ｎ３Ｈ６原料具有ｈ－ＢＮ单相组织．载气直接参与Ｂ３Ｎ３Ｈ６气相合成ＢＮ的反应过程，决定薄膜的结构特征，影响薄膜的性能．

Boron nitride (BN) films were deposited by remote microwave plasma enhanced chemical Vapour deposition (MPECVD) with a mixture of borazine with nitrogen, hydrogen, and argon, respectivelyl as a precursor. The resultant films were characterized by diffuse reflectance Fourier transform infred (DR/FTIR) spectra, Knoop hardness, and friction-detected scratch test. Optimum conditions for deposited BN films were found to be the borazine-nitrogen and borazine-hydrogen mixtures, and at the substrate temperature of 550℃. The BN films were a mixture of crystalline cubic BN accounting for the major content and hexagonal BN with relatively low hydrogen content. No cubic BN was obtained from the borazine-argon mixture under the same deposition condition. It was found that the cubic BN formation depends on production of the intermediate species of cyclotriborazane ((BH2NH2)3) and its dehydrogenation. The structural bonds of cyclotriborazane are similar to that of cubic BN.