二氧化锡纳米薄膜的AFM研究与气敏性能测试

AFM characterization and gas sensitivity of SnO_2 thin films

以SnCl2·2H2O为反应前驱物,采用溶胶-凝胶法制备了二氧化锡纳米薄膜,对薄膜制备过程中原料的浓度、陈化时间、提拉速度、烧结温度、烧结时间等影响因素进行了系统的研究,获得了较佳的制膜工艺条件,并测试了SnO2薄膜在室温下的气敏特性.结果表明,当Sn2+浓度为0.1 mol/L,陈化时间为60 h左右,提拉速度为80 mm/min,烧结温度为500℃,烧结时间为30 min时,制备出了高质量的SnO2纳米薄膜,成膜粒子均匀,粒径小,约为2 nm,而且薄膜对2～10 mg/L的乙醇和丙酮都有较好的敏感性和响应-恢复特性.

Nanometer sized SnO2 thin films were prepared by sol gel method using SnCl2· 2H2O as the starting material. The influences of different conditions, such as the concentration of raw material, aging time, dip coating speed, heating temperature and heating time, were investigated. The optimum experimental conditions were obtained. The sensitivity of the films was measured at room temperature. The results showed that when the solution （0 1 mol/L） was left for 60 h, the uniform films were deposited at the dip coating rate of 80mm/min, then heated at 500℃ for 30min and the mean size of SnO2 particles was about 2 nm. The gas sensing experiments illustrated that the thin films had good sensitivity and response recovery properties to ethanol and acetone were from 2 to 10 mg/L at room temperature.