摘要
A method for fabricating three-dimensional （3D） photonic crystals （PhCs） easily and simply, by using a visible light （- 532 nm） to pass one triangular pyramid to form non-coplanar multi-beam interference, named laser interference etching technique, is reported. In the experiment, we exposed a 9-μm-thick photo- resist on the silicon substrate with exposure intensities of 150, 180, and 220 mJ/cm^2, and produced the periodical nanostructures. Through varying a common angle in the triangular pyramid, other interference patterns can be obtained to fabricate various PhCs.
A method for fabricating three-dimensional （3D） photonic crystals （PhCs） easily and simply, by using a visible light （- 532 nm） to pass one triangular pyramid to form non-coplanar multi-beam interference, named laser interference etching technique, is reported. In the experiment, we exposed a 9-μm-thick photo- resist on the silicon substrate with exposure intensities of 150, 180, and 220 mJ/cm^2, and produced the periodical nanostructures. Through varying a common angle in the triangular pyramid, other interference patterns can be obtained to fabricate various PhCs.
基金
The authors thank Department of Physics, Hong Kong University of Science and Technology for support.
