极紫外光刻机工件台设计及仿真(英文)

Design and Simulation of a Wafer Stage for Extreme Ultra Violet Lithography

作为极紫外光刻机的一个关键子系统,真空工件台的精度、速度、加速度、动态特性及同步性能对于光刻图形精度和光刻机的产率都起着重要作用．设计了一种适用于极紫外光刻机的真空工件台系统,该系统具有体积小、质量轻、精度高等特点．为了验证结构的合理性,还对工件台进行了结构仿真:包括静态仿真、瞬态仿真和模态仿真．仿真结果表明:结构设计合理,结构变形和固有频率均能满足光刻机的要求．

Vacuum stage is a key subsystem of extreme ultra violet lithography （EUVL） and its accuracy, velocity, acceleration, dynamic characters and synchronous scanning are decisive factors for image quality and throughput of the whole machine. A kind of magnetic levitated wafer stage is designed. The wafer stage is compact, light, and precise. To verify the feasibility of the design, some simulation work including static, transient and modal simulation has been done. The results show that the structure design is reasonable and the structural deformation and natural frequency can meet the requirement of the lithography.