CN_x薄膜的PCVD制备及研究

CARBON NITRIDE FILM PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND STRUCTURE STUDY

ＣＮｘ薄膜是一种新型的超硬膜。我们用等离子增强化学气相淀积法（ＰＣＶＤ），制备出了含氮量为２１ａｔ％的ＣＮｘ膜，并用俄歇电子探针，红外谱仪和拉曼光谱仪及Ｘ光衍射仪对其结构进行了研究。结果表明膜中氮元素主要以Ｃ≡Ｎ，Ｃ＝Ｂ，Ｃ—Ｎ键的形式与碳结合。ＣＮｘ薄膜中含有β－Ｃ３Ｎ４的微晶成分。其显微硬度为Ｈｖ＝２６５０ｋｇ／ｍｍ２。

Carbon nitride film prepared by plasma enhanced chemical vapor deposition andstructure study are reported in this paper.AES,IR, Raman XRD are used to study the structureof the film.N content of the film is 21 at%.C N,C=N,C≡N bonds was found in the film.The crystal of β C3N4was also found in the film.The film's Vickers hardness was mearsured tobe 2 650kg/mm2.