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应用于微结构制造自治系统的结构描述语言 被引量:1

A Microstructure Description Language Defined for an Electronic Manufacturing Automation System
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摘要 本文介绍一种微结构描述语言。借助于这种描述语言,包括集成电路、MEMS等在内的各类微、纳尺寸的器件,都能够得到描述并借此进入微结构制造自治系统。微结构制造自治系统是我所提出的一种概念性系统,意指具备一定的智能,能够应对多种制造过程突发情况的全自动化的集成电路无人制造系统。系统在获得特定加工对象的结构描述之后,可对结构进行分析,提取结构特征并自动生成加工制造工艺。本文结合一个CMOS结构实例,介绍了所定义的微结构描述语言的各项先进特性。这方面研究工作的重要意义在于,每个微结构器件,包括将要被发明的,可视为微结构描述语言所能够描述的对象集中的一个特例,从而得到统一的分析与处理。结构特征的分析,为接下来的工艺流程自动生成工作搜集和准备了必要的结构信息。 A microstructure description language (MDL) is defined and discussed. Arbitrary microstructures, including ICs , MEMS , etc., can all be described, and then fed into the electronic manufacturing automation ( EMA ) system. An electronic manufacturing automation system is such a conceptual system that it can independently manufacture products under various real time situations. After the description of an object to be fabricated being delivered to the EMA system, the system can analyze the device structure, extract the structure characteristics, and generate a process flow for the structure. A CMOS structure is utilized to show the advanced properties of the description language defined. As a result, all kinds of devices, including those to be invented, can be regarded as MDL instances, so that these devices can be dealt with in a systematic zoay. The ztork described here gathers necessary structural information and prepares the subsequent process flow generating. Key words: microstructure description language (MDL), microstructure manufacturing methodology ( MMM or M3), electronic manufacturing automation ( EMA ), process developing
出处 《世界科技研究与发展》 CSCD 2005年第6期1-8,共8页 World Sci-Tech R&D
关键词 微结构描述语言 微结构制造 自治系统 工艺开发 microstructure description language (MDL), microstructure manufacturing methodology (MMM or M^3), electronic manufacturing automation (EMA), process developing
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参考文献5

  • 1D R Coelho."VHDL:a call for standards,"in Design Automation Conference,1988.Proceedings.,25 th ACM/IEEE,pp.40 ~ 47
  • 2R Waxman,J H Aylor,E Marschner."The VHSIC hardware description language (IEEE standard 1076):language features revisited," in Compcon Spring '88.Thirty-Third IEEE Computer Society International Conference,Digest of Papers,pp.310~ 315
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  • 4M H Zaman,E T Carlen,C H Mastrangelo."Automatic Generation of Thin Film Process Flows-Part Ⅰ:Basic Algorithms," IEEE Trans.Semiconduct.Manuf.,Feb.1999,vol.12 ,pp.116~128
  • 5M H Zaman,E T Carlen,C H Mastrangelo."Automatic Generation of Thin Film Process Flows-Part Ⅱ:Recipe Generation,Flow Evaluation,and System Framework," IEEE Trans.Semiconduct.Manuf.,Feb.1999,vol.12,pp.129~138

同被引文献2

  • 1M.H.Zaman,E.T.Carlen,and C.H.Mastrangelo.Automatic Generation of Thin Film Process Flows-Part Ⅰ:Basic Algorithms.IEEE Trans.Semiconduct.Manuf.,116~128.
  • 2M.H.Zaman,E.T.Carlen,and C.H.Mastrangelo.Automatic Generation of Thin Film Process Flows-Part Ⅱ:Recipe Generation,Flow Evaluation,and System Framework.IEEE Trans.Semiconduct.Manuf.,1999,12:129~ 138.

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