摘要
本文基于作者提出的“函数逼近的数值迭代概念”，修正了电磁复合场中电子成像系统的三级几何像差方程式，给出了具有更高精度的像差计算公式和用集中参数形式描述的像差系数表达式，为像差的数值计算和电子光学系统的计算机优化设计提供了实用的理论依据。
The corretion of third-order geometrical aberration equation in combined fields is made, based on the concept of function approaching and numerical iteration reported by author in another paper. The calculating formula for aberrations with higher precision and expression for aberration coefficients described by lumped parameters are given. The conclusions given in this paper provide a practical theoritical basis for numerical calculation of aberrations and computer-aided optimum design of electron optics system.
出处
《微细加工技术》
1996年第1期7-16,共10页
Microfabrication Technology
关键词
电子光学
像差
电磁复合场
三级几何像差
electron optics
aberration, electron beam lithography
electron microscope
