摘要
本文叙述了曝光照明系统的均匀照明原理及实现方法，并提出用计算模拟的方法研究曝光系统的光照分布情况，编制了相应的计算模拟程序。作为实例，给出了作者设计的两个典型的曝光系统光照分布的计算模拟结果。
The principle of uniform illumination of the illumination system for optical photolithography and it' S practice method are described. The study of the intensity distribution of the illumination systems by the calculating simulation is provided. As examples, the calculating simulation results of two typical systems designed by authors recently are given.
出处
《微细加工技术》
1996年第1期23-28,共6页
Microfabrication Technology
关键词
曝光系统
光照分布
计算模拟
光刻
exposure system
distribution of illumination intensity
calculating simulation
