摘要
尝试使用一种新的工艺———旋涂法来达到图案复制的目的,介绍了旋涂法完成图案复制的实验过程,就印章及其复制品的尺寸作了对比,并分析了实验中观察到的缺陷。得出在精确控制实验条件的前提下,可以通过旋涂方法得到高品质微纳米级图案的结论。
Nanoimprint lithography is a promising technique of the Next Generation Lithography （NGL）. In the technological process of imprint, the key process is how to transfer the pattern. The traditional methods of pattern replication are hot embossing and injection molding, but in this experiment the spin-coating is attempted to transfer from the template to the PDMS. The images on PDMS film are compared with the template. And the causes of some defects are anlaysed. It approves that replication can also be accomplished by spin-coating.
出处
《微细加工技术》
EI
2005年第4期21-24,36,共5页
Microfabrication Technology
基金
上海市科委纳米专项资助项目(0352nm010)
国家863计划非硅MEMS加工技术及其应用研究资助项目(2004AA404260)
关键词
纳米压印
微复制
旋涂技术
PDMS印章
anoimprint lithography
micro-replication
spin-coating
PDMS stamp
