冷变形量及退火温度对钽板再结晶组织的影响

Effect of Deformation and Annealing Temperature on the Microstructure of Tantalum Plate

采用扫描电镜和金相显微镜对深冲后的钽壳进行了表面观察和金相组织分析,同时研究了不同轧制变形量和退火方式对钽再结晶晶粒大小的影响。研究结果表明:细化晶粒是保证深冲钽壳良好表面质量的重要措施,退火前增大冷轧变形量有助于晶粒细化,电子束熔炼生产的纯钽起始再结晶温度为800℃左右,90%变形后经850℃×40 min退火可以得到较细的晶粒,采用适当的高温短时退火可以细化晶粒。

The surface and microstructure of the deep-drawn tantalum shell is observed by scanning electron microscope and optical microscope and effect of deformation and annealing treatment on the microstructure of tantalum plates is studied. It shows that grain refinement is very important to assure good surface quality of deep-drawn Ta shell. More cold-rolled deformation prior to annealing is good for finer grain for pure Ta produced by electron-beam smelting,with 90% rolling deformation, initial recrystallization temperature about 800 ℃ ,finer grain can be obtained after annealing at 850 ℃ for 40 min. And proper high-temperature short-time annealing can make grain finer.