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VHF-PECVD法制备氢化硅薄膜及单结电池

Hydrogented Microcrystalline Silicon Films and Single Junction Solar Cell by VHF-PECVD
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摘要 利用VHF-PECVD分解硅烷和氢气的混合气体来制备本征微晶硅薄膜。运用拉曼散射和X射线衍射研究了不同硅烷浓度对薄膜的影响。随着硅烷浓度的增加,沉积速率和光敏性增加而晶化率下降。将优化的本征材料应用到pin电池中,得到本征层厚度约为1μm的微晶电池,效率达5.87%。 Intrinsic microcrystalline silicon films were prepared by very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) from a mixture of silane highly diluted in hydrogen. The effect of different silane concentrations on the film was investigated by Raman scattering and X-ray diffraction.The deposition rate and photosensitivity increases while the Xc decreases with the increase of silane concentration. With the application of the optimized material in solar cells, an efficiency of 5.87% was obtained with a 1 μm intrinsic layer
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2005年第6期1122-1125,共4页 Journal of Synthetic Crystals
关键词 微晶硅 硅烷浓度 太阳电池 microcrystalline silicon silane concentration solar cell
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参考文献8

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