模拟空间原子氧对Teflon FEP/Al薄膜性能的影响(英文)

Simulated atomic oxygen of space environment effects on the properties of Teflon FEP/Al films

采用同轴原子氧模拟装置进行了空间原子氧效应对温控材料Teflon FEP/A l薄膜的影响研究.在束流密度为1.07×1016atoms/cm2.s的条件下,对材料进行不同剂量辐照,研究了Teflon FEP/A l薄膜的质量损失、表面形貌、表面粗糙度和光学性能的演化规律和表面元素的组成变化.试验结果表明,材料的质量损失与原子氧辐照剂量成正比例关系.随着原子氧辐照剂量的增加,材料的表面形貌由平整变为“地毯状”形貌,表面粗糙度、太阳吸收率和太阳吸收率与热发射率的比值发生明显变化,从而导致材料光学性能发生变化.辐照前后材料表面成份组成变化不大.

The effects atomic oxygen in space environment on thermal control materials were studied on the coaxial atomic oxygen lab simulation facility. The changes in mass, surface morphology, surface roughness, optical properties and surface composition of Teflon FEP/Al films were investigated. The samples were exposed to the atomic oxygen with the flux of 1.07 × 10^16atoms/cm^2 · s for different irradiation AO doses. The experimental results showed that the mass loss due to atomic oxygen effects was in proportion to the irradiation AO doses. The surface morphology of the samples significantly changed from smoothness to “carpet -like” appearances when AO exposure doses increased. The changes in the surface roughness, solar absorptance and the ratios of αs/ε obviously increased with irradiation AO doses increasing. The surface morphology and roughness are important factors to influence the solar absorptance of the sample. The surface composition of Teflon FEP/Al films slightly changes after AO exposure.