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非平衡磁控溅射离子镀MoS_2-Ti复合薄膜的结构及性能 被引量:2

Structure and properties of MoS_2-Ti composite films deposited by unbalanced magnetron sputter ion plating
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摘要 用非平衡磁控溅射离子镀法沉积了钛含量不同的MoS2-Ti复合薄膜,电子探针分析表明共沉积钛可以降低MoS2薄膜中氧杂质的含量,XRD分析显示薄膜具有类似非晶的结构.划痕试验结果显示薄膜的临界载荷都大于100 N,球盘磨损试验结果显示MoS-Ti复合薄膜比MoS薄膜耐磨性好,并且摩擦系数低于0.07. MoS2 oTi composite films with different titanium concentrations are deposited by unbalanced magnetron sputter ion plating. Electron probe microanalysis (EPMA) shows that the oxygen content of the MoS2 films can be decreased by co-depositing titanium. XRD indicates that the films are quasi-amorphous structure. The scratch tests show that the films undergo no failure up to a load of 100 N. The pin-on-disc tests indicate that the MoS2-Ti composite films are more wear resistant than MoS2 film and retain low friction coefficients (under 0.07).
出处 《山东大学学报(工学版)》 CAS 2005年第6期20-23,共4页 Journal of Shandong University(Engineering Science)
基金 山东省科学技术发展计划项目(032110102)
关键词 二硫化钼 复合薄膜 摩擦性能 MoS2 titanium composite film tribological property
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