期刊文献+

影响大电流热阴极辉光放电稳定工作的因素 被引量:2

Factors Affecting the Stability of Large Current Hot Cathode Glow Discharge
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摘要 大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜,有效地提高了沉积速率和膜品质.大电流辉光放电具有较强的向弧光放电转化趋势,本文研究了影响大电流热阴极辉光放电稳定工作的因素,结果表明,阴极温度、表面形貌、阴阳极位置和尺寸配置关系等对辉光放电的稳定性均有不同程度的影响. Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently. Large current glow discharge has a strong tendency to transform to arc discharge. This paper focuses our attention on the factors affecting the stability of large current hot cathode glow discharge. The research results show that the cathode temperature, the cathode surface state and the size and place disposition between cathode and anode have influences on the stability of glow discharge, respectively.
出处 《吉林大学学报(理学版)》 CAS CSCD 北大核心 2006年第1期89-92,共4页 Journal of Jilin University:Science Edition
基金 "863"计划新材料领域资助项目基金(批准号:2002AA325090)
关键词 热阴极 辉光放电 稳定性 hot cathode glow discharge stability
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参考文献5

  • 1金曾孙 吕宪义 姜志刚.热阴极辉光等离子体化学气相沉积制备金刚石膜的工艺[P].中国专利 ZL941 16283.4[P].1999-09-26.
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二级参考文献5

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共引文献19

同被引文献9

  • 1白亦真,吕宪义,金曾孙,姜志刚.钽阴极在热阴极辉光放电中行为与防护[J].大连理工大学学报,2006,46(2):157-159. 被引量:2
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  • 7BAI Yi-zhen,JIN Zeng-sun,L(U) Xian-yi,et al.Influence of cathode temperature on gas discharge and growth of diamond films in DC-PCVD processing[J].Diamond & Related Mater,2005,14:1494-1497
  • 8BAI Yi-zhen,JIN Zeng-sun,L(U) Xian-yi,et al.High rate growth of thick diamond films by high-current hot-cathode PCVD[J].J Crystal Growth,2005,280:539-544
  • 9金曾孙,姜志刚,白亦真,吕宪义.直流热阴极PCVD法制备金刚石厚膜[J].新型炭材料,2002,17(2):9-12. 被引量:20

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