摘要
对惯性约束聚变的一种重要诊断方法——Kirkpatrick-Baez型结构显微镜成像方法进行了研究。计算了Kirkpatrick-Baez型结构显微镜的主要像差.并分析得出:造成轴上点像差的主要因素是球差,占像差的94%。基于光线追迹方法模拟出这种结构的成像过程,比较了不同反射镜长随视场变化对物面分辨率的影响,发现为了保证物面的空间分辨率能达到ICF研究要求视场应尽量控制在200μm以内。最终得出能量在8keV、视场为200μm,分辨率小于10μm的Kirkpatrick-Baez型结构的模型。提出在装凋过程中重要公差计算方法,得到数值孔径为0.0037时,角度装调公差应在-0.087°~0.067°范围内。
An important diagnosis method Kirkpatriek-Baez microscope system in ICF experiments was researched. The brief aberration of the Kirkpatrick-Baez microscope was calculated. The main aberration, spherical aberration was analyzed, and the spherical aberration is 94% of the total aberration. The configuration was simulated by the ray tracing method. Resolutions in different fields and mirror-lengths were compared. The modal of Kirkpatrlck-Baez microscope was made in computer with 10μm resolution at 8 keV. It was studied about the adjusting tolerance method of Kirkpatrick-Baez microscope. When numerical aperture is 0.003 7, the angle error range is -0. 087°-0. 067°.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2006年第1期61-65,共5页
High Power Laser and Particle Beams
基金
国家863计划项目资助课题