器件结构中材料应力的控制和优化方法

Methods for Controlling and Optimizing the Material Stresses in Device Structure

在对器件结构中材料应力进行分析和测量的基础上，提出了控制和优化器件结构中材料应力的几种方法，包括合理选择工艺条件、采用多层复合膜技术、确定双层结构的最佳厚度值以及选择适当的材料种类等。实际应用结果表明，这些方法是有效的和可行的。

On the basis of analysis and measurement results of material stresses in devices,several methods for controlling and optimizing the stress in device structure are presented and studied,including well choice of process condition,multilayer composition film technique,optimizing the thicknesses of bilayer structure and suitable selection of materials. Experimental results of stress measurement and application to devices have shown that these methods are effective and practical.