期刊文献+

化学镀Ni-P合金在电子工业中的应用 被引量:18

Application of Electroless Ni-P Alloys in Electronics Industry
下载PDF
导出
摘要 综述了化学镀N i-P合金在电子工业中的应用现状,涉及电磁屏蔽、计算机存储、微电子等诸多领域。重点介绍了化学镀N i-P合金应用在手机外壳、计算机硬盘、晶片、印制电路板等典型实例。同时介绍了化学镀N i-P合金镀层在其它领域的广泛应用,并预测了其在电子工业中的应用前景。 Current status of application of electroless Ni P alloys in electronics industry involving the areas of electromagnetic shielding, computer storage, microelectronics was briefly reviewed. Some typical application examples in mobilephone shell, computer hard disk, wafer, printed circuit board were introduced. Widespread applications of eleetroless Ni-P alloys in other fields were also presented and their development prospect was previewed.
出处 《电镀与精饰》 CAS 2006年第1期30-34,52,共6页 Plating & Finishing
基金 上海科技发展基金(03525nm025和035211037)
关键词 化学镀 Ni—P合金 电子工业 electroless Ni-P alloy electronics industry
  • 相关文献

参考文献28

  • 1黎永钧.化学镀镍合金在电子工业中的应用[J].电子工艺技术,1998,19(5):185-189. 被引量:12
  • 2汪荣华,部嘉谦.铝蜂窝屏蔽通风窗化学镀镍[J].电化学,1996,2(2):193-197. 被引量:1
  • 3王清洲.[EB/OL].中国电磁兼容网 http://www.emechina.org/tech/tech.asp?id=393,2001-07-27.
  • 4Huang C Y, Mo W W, Roan M L. The influence of heart treatment on electroless-nickel coated fibre(ENCF) on the mechanical properties and EMI shielding of ENCF reinforced ABS polymeric composites[J]. Surface and Coatings Technology, 2004, 184:123- 132.
  • 5Huang C Y, Mo W W, Roan M L. Studies on the influence of double layer electroless metal deposition on the electromagnetic interference shielding effectiveness of carbon fiber/ABS composites[J]. Surface and Coatings Technology, 2004, 184:163- 169.
  • 6夏传义.化学镀在电子工业中的应用[J].电镀与涂饰,1999,18(4):42-50. 被引量:10
  • 7Bellemare R, Vignati P. Electroless nickel: Deposit Properties, Specifications and Applications[EB/OL].http ;//www. pfonline, com/artieles/pfd0024, html,1995-06-15.
  • 8Sullivan E J, Schrott A G, Paunovie M, et al. Electrolessly deposited diffusion barriers for microelectronics [EB/OL]. http://www, research. ibm. com/journal/rd/425/osullivan, html, 1998-11-05.
  • 9Rohan J F, Riordan G, Boardman J. Selective electroless nickel deposition on copper as a final barrier/bonding layer material for microelectronics applications[J]. Applied Surface Science, 2002, 185: 289-297.
  • 10Riley G. Electroless nickel- gold flip chip[EB/OL].http://www, flipchips, com/tutoria107, html, 1999-09-20.

二级参考文献65

共引文献68

同被引文献165

引证文献18

二级引证文献59

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部